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For the Inventor, By the Inventor

Ridgefield, CT, United States of America

Rodney A Kendall

This inventor holds 30 USPTO granted patents, primarily in Electron Beam Lithography. Top assignees: International Business Machines Corporation, Nikon Corporation, Nuflare Technology, Inc.. Active years: 1991-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rodney A Kendall. Retrieved from https://idiyas.com/inventor/rodney-a-kendall

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30

% Patents Active = 93.3

Average Co-Inventor Count = 2.0

ph-index = 11

Forward Citations = 346(Granted Patents)


Location History:

  • Fairfield County, CT (US) (1995 - 1996)
  • Ridgefield, CT (US) (1991 - 2020)

Company Filing History:

goldMedal20 out of 166,409 
 
International Business Machines Corporation
 patents
silverMedal8 out of 8,997 
 
Nikon Corporation
 patents
bronzeMedal2 out of 748 
 
Nuflare Technology, Inc.
 patents
4. 1 out of 20 
 
Nuflare Technology America, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1991-2020

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Areas of Expertise:
Electron Beam
Lithography
Calibration Target
High Precision
Electron Source
Particle Beam
Thermally Stable
Positioning System
Clamping Mechanism
Nano-Metrology
Vacuum Feedthrough
Vibration Isolation
30 patents (USPTO):Explore Patents
1. 10714311 - Individual beam detector for multiple beams, multi-beam irradiation apparatus, and individual beam detection method for multiple beams (2020-07-14),
2. 7544951 - Electron gun assembly (2009-06-09),
3. 6908255 - Remote clamping mechanism via vacuum feedthrough (2005-06-21),
4. 6818906 - Electron beam position reference system (2004-11-16),
5. 6724001 - Electron beam lithography apparatus with self actuated vacuum bypass valve (2004-04-20),
6. 6639219 - Electron scatter in a thin membrane to eliminate detector saturation (2003-10-28),
7. 6596999 - High performance source for electron beam projection lithography (2003-07-22),
8. 6588090 - Fabrication method of high precision, thermally stable electromagnetic coil vanes (2003-07-08),
9. 6483117 - Symmetric blanking for high stability in electron beam exposure systems (2002-11-19),
10. 6437347 - Target locking system for electron beam lithography (2002-08-20),
11. 6414313 - Multiple numerical aperture electron beam projection lithography system (2002-07-02),
12. 6369396 - Calibration target for electron beams (2002-04-09),
13. 6353231 - Pinhole detector for electron intensity distribution (2002-03-05),
14. 6252339 - Removable bombardment filament-module for electron beam projection systems (2001-06-26),
15. 6246053 - Non-contact autofocus height detector for lithography systems (2001-06-12),

Title: The Innovative Mind of Rodney A. Kendall

Introduction: Rodney A. Kendall is a prominent inventor based in Ridgefield, Connecticut. With an impressive portfolio of 30 patents, he has made significant contributions to the fields of beam detection and electron beam technology. His inventive prowess continues to impact various industries, driven by his commitment to innovation and excellence.

Latest Patents: Among his most recent patents are the "Individual Beam Detector for Multiple Beams," the "Multi-Beam Irradiation Apparatus," and the "Individual Beam Detection Method for Multiple Beams." The individual beam detector utilizes a thin film featuring a passage hole that allows for the penetration of multiple beams while optimizing detection accuracy. Additionally, the electron gun assembly patent highlights a device designed to perform specific functions through the generation of electron beams, showcasing a rotatable structure that enhances electric field concentrations for improved performance.

Career Highlights: Rodney A. Kendall has had a distinguished career, working for renowned companies such as International Business Machines Corporation (IBM) and Nikon Corporation. His experience in these leading technology firms has undoubtedly shaped his innovative capabilities, allowing him to push the boundaries of engineering and design.

Collaborations: Throughout his career, Kendall has collaborated with notable colleagues, including David J. Pinckney and Timothy R. Groves. These partnerships have contributed to the development of cutting-edge technologies, reinforcing the importance of teamwork in the innovation process.

Conclusion: Rodney A. Kendall's contributions to the field of patents and inventions are significant and influential. His latest patents and collaborations reflect his dedication to advancing technology and improving detection methods. As he continues to innovate, Kendall's work serves as an inspiration to aspiring inventors and established professionals alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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