The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2002

Filed:

Aug. 31, 1998
Applicant:
Inventors:

Steven Douglas Golladay, Hopewell Junction, NY (US);

Rodney Arthur Kendall, Ridgefield, CT (US);

Michael Stuart Gordon, Lincolndale, NY (US);

Carl Emil Bohnenkamp, Hopewell Junction, NY (US);

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7304 ;
U.S. Cl.
CPC ...
H01J 3/7304 ;
Abstract

An instrument for measurement of illumination intensity distribution of an Electron Beam Projection System (EBPS) comprises a reticle with a clear subfield, a pinhole plate comprising a block of a low atomic number material with a high aspect ratio pinhole therethrough, the pinhole plate being positioned at the image plane of the EBPS. Means is provided for detecting electrons passing through the pinhole, and means is provided for moving, scanning, the pinhole with respect to a fixed electron intensity distribution or scanning the electron intensity distribution with respect to pinhole when held in a fixed position.


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