International Business Machines Corporation

Nikon Corporation

Nuflare Technology, Inc.

Nuflare Technology America, Inc.

Rodney A Kendall

David J Pinckney

Timothy R Groves

Michael S Gordon

Werner Stickel

Steven D Golladay

John George Hartley

Maris A Sturans

Samuel Kay Doran

Carl Emil Bohnenkamp

Richard Rieland

James L Speidell

Tomohiko Abe

Christopher Frederick Robinson

Norman Bobroff

Paul F Petric

James D Rockrohr

Victor Katsap

William A Enichen

Shinichi Kojima

Yoshikuni Goshima

Henri A Khoury

Michael Stuart Gordon

Clay S Clement

Gary J Johnson

Richard D Moore

Lonn E Moore

David John Pinckney

David A Pickney

An individual beam detector for multiple beams includes a thin film in which a passage hole smaller than a pitch between beams of multiple beams and larger than the diameter of a beam is formed and through which the multiple beams can penetrate, a support base to support the thin film in which an opening is formed under the region including the passage hole, and the width size of the opening is formed to have a temperature of the periphery of the passage hole higher than an evaporation temperature of impurities adhering to the periphery in the case that the thin film is irradiated with the multiple beams, and a sensor arranged, at the position away from the thin film by a distance based on which a detection target beam having passed the passage hole can be detected by the sensor as a detection value with contrast discernible.

Individual beam detector for multiple beams, multi-beam irradiation apparatus, and individual beam detection method for multiple beams

A device which employs an electron beam, for performing a desired function, includes an electron gun for generating the electron beam. The electron gun includes a barrel shaped rotatable structure having a plurality of annularly disposed electron sources. A curvature of a surface portion of the rotatable structure is shaped to optimize electric field concentrations. The rotatable structure further includes end portion protrusions.

Electron gun assembly

A clamping flexure for use in a vacuum employs a spring-loaded shaft that pulls an object being supported against a support piece, including a mechanism, passing through the vacuum vessel, for releasing the spring tension during adjustment, the shaft being sufficiently compliant that restoring force after adjustment is less than a threshold value so that displacement of the shaft does not impress a force on the object being supported that returns it toward its position before adjustment.

Remote clamping mechanism via vacuum feedthrough

A system for supporting and adjusting the position of an object in a vacuum includes inner and outer support rings that are connected by flexible mounts that are compliant along one axis and stiff along other axes, and drivers extending through the wall of the vacuum chamber that move the supports independently along their respective axes. At least the inner support is clamped after adjustment by a clamp that exerts a strong clamping pressure while exerting transverse force only less than a threshold selected to avoid motion after adjustment.

Electron beam position reference system

An electron beam lithography apparatus has a first chamber for holding a workpiece with the first chamber having an outer wall with an opening therein. A second chamber has an electron beam column mounted therein, with the second chamber positioned adjacent the first chamber and having an outer wall having a portion in common with the portion of the outer wall of the first chamber containing the opening. An electron beam column in the second chamber includes an aperture and generates an electron beam through the aperture and the opening at the workpiece. The apparatus includes a first pump for creating a vacuum in the first chamber, a second pump for creating a vacuum in the second chamber, a first vent for permitting gas to enter the first chamber for increasing the pressure in the first chamber, and a second vent for permitting gas to enter the second chamber for increasing the pressure in the second chamber. A balancing bypass valve in the common wall between the first and second chambers (i) operates in a first mode to permit gases to flow from the first chamber to the second chamber when the pressure in said second chamber exceeds the pressure in the first chamber, (ii) operates in a second mode to permit gases to flow from the second chamber to the first chamber when the pressure in the first chamber exceeds the pressure in the second chamber, and (iii) operates in a third mode to seal the first chamber from the second chamber when the pressures in the first and second chambers are equal.

Electron beam lithography apparatus with self actuated vacuum bypass valve

An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.

Electron scatter in a thin membrane to eliminate detector saturation

The presence of magnetic fields from lenses and other (e.g. parasitic) sources at locations in a charged particle beam system such as the charged particle emitter, where the particles have little or no kinetic energy, creates disturbances of the charged particle trajectories, generating undesired angular momentum and resulting in excessive aberrations and associated adverse effects on system performance. Solutions are provided by suppression of these magnetic fields, by relocating the charged particle emitter away from the field source and/or counterbalancing the field with a bucking field. In addition, residual irrepressible field asymmetries are compensated by a suitable element such as a stigmator located at the correct location in the beam path, permitted by relocation of the charged particle emitter.

High performance source for electron beam projection lithography

The present invention relates to a method and apparatus of fabricating electromagnetic coil vanes. The method involves placing a bonding composition on opposing surfaces of a substrate. First and second complementary coil patterns are formed, and are aligned and bonded to respective clamp plate fixtures. The first complementary coil pattern is bonded to one surface of the opposing surfaces of the substrate via the bonding composition, and the second complementary coil pattern is bonded to the other surface of the opposing surfaces of the substrate via the bonding composition. The bonding composition is cured, and the clamp plates are removed from the first and second complementary coil patterns.

Fabrication method of high precision, thermally stable electromagnetic coil vanes

An electronic beam lithography tool providing dimensional stability. The tool includes three or more deflection plates above an aperture diaphragm which allows the beam to be deflected away from an aperture and along a two-dimensional locus on the aperture diaphragm which is approximately symmetrical around the aperture therein. By doing so, the aperture diaphragm is symmetrically heated by the power of the charged particle beam and the geometry of the charged particle beam device is stabilized against variance in geometry of the device to a very small tolerance.

Symmetric blanking for high stability in electron beam exposure systems

An e-beam lithographic system capable of in situ registration. The system has an optics section such as a VAIL lens. A controllable stage moves a substrate with respect to the beam axis to place substrate writing fields beneath the beam. A field locking target between the optics section and the stage has an aperture sized to permit the beam to write a target field on the substrate. The field locking target includes alignment or registration marks around the aperture. A differential interferometric system measures the relative positions of the field locking target and the stage and controls stage position. The beam patterns the substrate on a field by field basis. As the stage is moving into position for each field, the beam is swept until it hits the alignment marks, thereby checking system alignment. The beam control data, i.e., coil currents necessary to hit the marks are stored, and drift correction values calculated from the beam control data. Meanwhile, pattern beam control is compensated by the drift correction values.

Target locking system for electron beam lithography

A beam-limiting aperture truncates selected portions of a charged particle beam illuminating portions such as subfields of a patterned reticle of a charged particle beam projection lithography tool and then projects a pattern of charged particles onto a target in a charged particle beam lithography tool. The respective portions of the reticle are patterned in accordance with respective portions of an integrated circuit or other desired pattern and may have differing transmissivities; altering beam current at the target even when source beam current remains substantially constant. The portion of the beam which is truncated, thus altering the particle trajectory semi-angle and numerical aperture of the tool is controlled in accordance with the transmissivity of the reticle portion to enhance resolution to near optimal limits.

Multiple numerical aperture electron beam projection lithography system

A scattering target for use in a particle beam system is formed from a grid of gold on a substrate of carbon, with an intermediate smoothing layer (e.g. copper) on the carbon to provide a surface sufficiently smooth to provide an adequate target. An optional bonding layer may be used to improve adhesion between the gold and the smoothing layer.

Calibration target for electron beams

An instrument for measurement of illumination intensity distribution of an Electron Beam Projection System (EBPS) comprises a reticle with a clear subfield, a pinhole plate comprising a block of a low atomic number material with a high aspect ratio pinhole therethrough, the pinhole plate being positioned at the image plane of the EBPS. Means is provided for detecting electrons passing through the pinhole, and means is provided for moving, scanning, the pinhole with respect to a fixed electron intensity distribution or scanning the electron intensity distribution with respect to pinhole when held in a fixed position.

Pinhole detector for electron intensity distribution

This method and apparatus permit installing and removing an electron beam generating element comprising a filament or a cathode in a rapidly replaceable module. The apparatus is an electron gun system having an electron gun enclosure, a feed-through element extending through the electron gun enclosure, an electron beam generating element housed within a filament module housing and connected to the feed-through element, an electron gun column and a connector port in the gun enclosure for direct removal and replacement of the filament. The feed-through element and the filament module housing are removed, through the connector port, from the gun enclosure and then the filament is removed and replaced. A load-lock is provided above the connector port to avoid venting into the gun. A bellows can be used to facilitate removal of the gun with minimal exposure to ambient atmospheric gases.

Removable bombardment filament-module for electron beam projection systems

In a particle beam lithography system, focus adjustment is controlled by a measurement of the gap between the workpiece being processed and a reference surface, such as the bottom surface of the focus lens, using a pair of capacitive sensors mounted on an arm that rotates to place one sensor on the beam axis to measure the workpiece height and the other displaced from the beam aperture to measure the height of the reference surface. The sum of the two readings is constant (for a given gap dimension), so that the accuracy of the measurement is not affected by the position of the arm within the gap.

Growing community of inventors

Ridgefield, CT, United States of America

Rodney A Kendall