The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Aug. 31, 1998
Michael Gordon, Lincolndale, NY (US);
Steven Golladay, Hopewell Junction, NY (US);
Chris Robinson, Hyde Park, NY (US);
James Rockrohr, Hopewell Junction, NY (US);
Nikon Corporation, Tokyo, JP;
Abstract
A small pinhole aperture and a scintillator are used to observe resolution in a charged particle beam system which is particularly applicable to electron beam projection devices in which the beam is several orders of magnitude larger than the desired resolution and minimum feature size to be produced. A pattern having a feature which is of comparable size to the desired resolution to be observed is scanned across the aperture in two dimensions and a synchronized display of measured light output from the scintillator allows real-time observation of the effects of correction adjustments on the resolution of the system. In this manner, a rough adjustment to near optimum corrections can be obtained over the deflection field in a much reduced number of iterations.