The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2000
Filed:
Feb. 26, 1998
Applicant:
Inventor:
Steven D Golladay, Hopewell Junction, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ;
Abstract
Resolution of a symmetric magnetic doublet charged particle beam projection lens is improved by applying a non-uniform electrostatic field having the same symmetry conditions as the lens through the magnetic doublet which provides a maximum particle velocity at the plane of symmetry of the magnetic doublet. Since the same symmetry conditions are used for both the electrostatic and magnetic fields, the performance of the magnetic doublet is not compromised. Electrode configurations which provide more intense fields provide further reduction in aberrations for a given potential superimposed on the accelerating voltage.