Sohan Singh Mehta

Title: Sohan Singh Mehta: Innovator in Lithographic Patterning

Introduction

Sohan Singh Mehta is a notable inventor based in Saratoga Springs, NY (US). He has made significant contributions to the field of lithographic patterning, holding a total of 6 patents. His work focuses on advanced methods that enhance the manufacturing processes for semiconductor devices.

Latest Patents

Among his latest patents, Mehta has developed innovative techniques such as "Lithographic patterning to form fine pitch features." This method involves creating interconnect structures for chips by forming a hardmask layer on a dielectric layer, followed by a sacrificial layer. Openings are created in the sacrificial layer, allowing for precise patterning with a resist layer made of metal oxide material. Another significant patent is the "Litho-litho-etch double patterning method," which includes a series of steps to form intricate patterns in a resist layer using UV exposure and different developers.

Career Highlights

Throughout his career, Sohan Singh Mehta has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and Freescale Semiconductor, Inc. His expertise in lithographic techniques has positioned him as a valuable asset in these organizations.

Collaborations

Mehta has collaborated with several talented individuals in his field, including Ravi Prakash Srivastava and Sunil Kumar Singh. These collaborations have contributed to the advancement of lithographic technologies and have fostered innovation in semiconductor manufacturing.

Conclusion

Sohan Singh Mehta's contributions to lithographic patterning and semiconductor technology are noteworthy. His patents reflect a commitment to innovation and excellence in the field. His work continues to influence the industry and pave the way for future advancements.