The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Jul. 27, 2009
Hyung-rae Lee, Kyunggi-do, KR;
Dong Hee Yu, Kyunggi-do, KR;
Sohan Singh Mehta, Beacon, NY (US);
Niall Shepherd, Lagrangeville, NY (US);
Daniel a Corliss, Hopewell Junction, NY (US);
Hyung-Rae Lee, Kyunggi-do, KR;
Dong Hee Yu, Kyunggi-do, KR;
Sohan Singh Mehta, Beacon, NY (US);
Niall Shepherd, Lagrangeville, NY (US);
Daniel A Corliss, Hopewell Junction, NY (US);
Freescale Semiconductor, Austin, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Globalfoundries Singapore Pte., Ltd., Singapore, SG;
Abstract
A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe.