Dong Hee Yu

Title: Dong Hee Yu: Innovator in Semiconductor Technology

Introduction

Dong Hee Yu is a notable inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of dose correction systems. His innovative work has led to the development of a patented method that enhances the precision of semiconductor manufacturing processes.

Latest Patents

Dong Hee Yu holds a patent for a system and method titled "Semiconductor intra-field dose correction." This invention provides an automatic dose-correction recipe generation system. The system includes a dose-correction recipe generator, a reticle data unit, a slit data unit, a process data unit, a wafer data unit, a control unit, and an output or storage unit. The method involves receiving current and previous reticle and slit data sets, along with process and wafer conditions. It automatically generates a dose-correction recipe based on the received information and controls the dose accordingly.

Career Highlights

Throughout his career, Dong Hee Yu has worked with prominent companies in the semiconductor industry. He has been associated with Freescale Semiconductor, Inc. and IBM, where he contributed to various projects and advancements in technology. His experience in these organizations has helped him refine his skills and knowledge in semiconductor manufacturing.

Collaborations

Dong Hee Yu has collaborated with several professionals in his field, including Hyung-Rae Lee and Sohan Singh Mehta. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Dong Hee Yu is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patented methods and collaborations with industry leaders highlight his commitment to advancing the field. His contributions continue to influence the semiconductor manufacturing landscape.