Zhubei, Taiwan

Shyue-Shyh Lin

This inventor holds 28 USPTO granted patents, primarily in Integrated Circuits. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2004-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shyue-Shyh Lin. Retrieved from https://idiyas.com/inventor/shyue-shyh-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 71.4

Average Co-Inventor Count = 5.1

ph-index = 8

Forward Citations = 301(Granted Patents)


Location History:

  • Nan-Tao Hsien, TW (2004)
  • Hsinchu, TW (2008 - 2016)
  • Chutung, TW (2016)
  • Zhubei, TW (2013 - 2019)
  • Hsinchu County, TW (2020 - 2023)

Company Filing History:


Years Active: 2004-2024

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Areas of Expertise:
Integrated Circuits
FinFET
Manufacturing Methods
Polysilicon Resistor
Metal Gate Resistor
Hybrid Gate Process
Contact Plugs
Charge Balanced Dielectric
Memory Array
Power Rails
Non-Hierarchical Metal Layers
Semiconductor Devices
28 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Shyue-Shyh Lin and His Contributions to Integrated Circuits

Introduction: Shyue-Shyh Lin, based in Zhubei, Taiwan, is a prominent inventor in the field of integrated circuit technology. With an impressive portfolio of 28 patents, he has made significant contributions to the advancements in semiconductor manufacturing. His work, particularly in the design and fabrication of integrated circuits, has had a profound impact on the industry.

Latest Patents: Among Shyue-Shyh Lin's latest innovations is a patent for integrated circuits and manufacturing methods. This sophisticated design involves a first diffusion area for a first type transistor, which includes a first drain region and a first source region. Additionally, a second diffusion area for a second type transistor, separated from the first diffusion area, is included. The design features a gate electrode that extends across both diffusion areas, maintaining electrical integrity across the integrated circuit. The configuration also includes metallic structures that ensure efficient connectivity between various components of the circuit.

Career Highlights: Shyue-Shyh Lin has established a reputable career through his work at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he has played a critical role in advancing manufacturing technologies. His contributions have helped TSMC maintain its leadership position in the semiconductor industry, pushing the boundaries of innovation in integrated circuit design.

Collaborations: Throughout his career, Shyue-Shyh Lin has collaborated with notable colleagues, including Li-Chun Tien and Lee-Chung Lu. Together, they have worked on various projects that have furthered the development of cutting-edge semiconductor solutions. These collaborations have not only enriched his own inventions but have also contributed to the broader technological advancements in the field.

Conclusion: Shyue-Shyh Lin's dedication to innovation in integrated circuit design illustrates the importance of inventors in shaping the future of technology. His 28 patents highlight his expertise and commitment to advancing the semiconductor industry. As he continues to explore new frontiers in integrated circuits, Shyue-Shyh Lin remains a key figure to watch in the realm of inventions and technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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