Shyh-Dar Lee

This inventor holds 22 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Silicon Integrated Systems Corporation, Industrial Technology Research Institute. Active years: 2001-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shyh-Dar Lee. Retrieved from https://idiyas.com/inventor/shyh-dar-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22

% Patents Active = 77.3

Average Co-Inventor Count = 1.9

ph-index = 8

Forward Citations = 258(Granted Patents)

Location History:

Hsinchu, TW (2001 - 2003)
Hsinchu Hsien, TW (2002 - 2004)

Company Filing History:

19 out of 295

Silicon Integrated Systems Corporation

patents

3 out of 9,307

Industrial Technology Research Institute

patents

Years Active: 2001-2004

Loading Chart...

Areas of Expertise:

Dual Damascene

Metal Capacitors

Low K Dielectric

Barrier Layer

Copper Interconnects

Plasma Treatment

Capacitor Fabrication

CVD Process

Micro-Scratches

Dielectric Barrier

ULSI ARL

Stacked Dielectric

22 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6696222 - Dual damascene process using metal hard mask (2004-02-24),

2. 6649512 - Method for improving adhesion of a low k dielectric to a barrier layer (2003-11-18),

3. 6603167 - Capacitor with lower electrode located at the same level as an interconnect line (2003-08-05),

4. 6593225 - Method of forming a stacked dielectric layer on a semiconductor substrate having metal patterns (2003-07-15),

5. 6548409 - Method of reducing micro-scratches during tungsten CMP (2003-04-15),

6. 6521523 - Method for forming selective protection layers on copper interconnects (2003-02-18),

7. 6514815 - Method for fabricating polysilicon capacitor (2003-02-04),

8. 6512260 - Metal capacitor in damascene structures (2003-01-28),

9. 6504205 - Metal capacitors with damascene structures (2003-01-07),

10. 6503835 - Method of making an organic copper diffusion barrier layer (2003-01-07),

11. 6495877 - Metal capacitors with damascene structures and method for forming the same (2002-12-17),

12. 6495448 - Dual damascene process (2002-12-17),

13. 6492226 - Method for forming a metal capacitor in a damascene process (2002-12-10),

14. 6486059 - Dual damascene process using an oxide liner for a dielectric barrier layer (2002-11-26),

15. 6483142 - Dual damascene structure having capacitors (2002-11-19),

Title: The Innovative Journey of Inventor Shyh-Dar Lee

Introduction: Shyh-Dar Lee, a distinguished inventor hailing from Hsinchu Hsien, TW, has made significant contributions to the field of technology and innovation.

Latest Patents: Shyh-Dar Lee's latest patents focus on cutting-edge advancements in semiconductor technology, including novel methods for enhancing chip performance and efficiency.

Career Highlights: With a career spanning over two decades, Shyh-Dar Lee has held key roles in leading tech companies, driving research and development efforts that have resulted in groundbreaking inventions.

Collaborations: Throughout his career, Shyh-Dar Lee has collaborated with top researchers, engineers, and industry experts to push the boundaries of technological innovation and bring revolutionary ideas to life.

Conclusion: Shyh-Dar Lee's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor in the ever-evolving tech landscape.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]