Location History:
- Ibaraki, JP (2006 - 2012)
- Tokyo, JP (2020)
Company Filing History:
Years Active: 2006-2020
Title: Innovations of Shuichi Irumata
Introduction
Shuichi Irumata is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets and barrier films. With a total of 10 patents to his name, Irumata's work has had a substantial impact on various industries.
Latest Patents
Irumata's latest patents include a method for manufacturing sputtering targets that improves the controllability of crystal orientation. This method involves shaping raw material powders, such as metals and metal oxides, into desired target shapes using an additive manufacturing method. Another patent focuses on enhancing production efficiency by bonding a backing plate with a sputter part, also utilizing additive manufacturing techniques. Additionally, he has developed a barrier film for flexible copper substrates, which consists of a Co—Cr alloy film. This barrier film is designed to prevent film peeling and inhibit the diffusion of copper to resin films, ensuring effective barrier characteristics even under heat treatment.
Career Highlights
Throughout his career, Irumata has worked with prominent companies such as JX Nippon Mining & Metals Corporation and Nippon Mining & Metals Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials engineering and innovation.
Collaborations
Irumata has collaborated with notable colleagues, including Ryo Suzuki and Yasuhiro Yamakoshi. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Shuichi Irumata's innovative work in the field of sputtering targets and barrier films showcases his expertise and dedication to advancing materials science. His contributions continue to influence various industries, making him a significant figure in the realm of invention.