Shu-Wei Chung is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on advancing the capabilities of semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is for a capacitor in a nanosheet structure. This semiconductor device includes a substrate with a first and second nanosheet structure, each featuring source/drain regions and a conductive gate contact. A first oxide structure is positioned between these nanosheet structures, and a conductive terminal is integrated within the oxide structure, defining a capacitor. Another notable patent involves integrated circuit features with obtuse angles. This method includes forming a seed layer on a semiconductor wafer, applying a photo resist, and utilizing photolithography to create openings for metal pads and lines. The innovative design ensures that all angles adjacent to the first opening exceed 90 degrees, enhancing the performance of the integrated circuit.

Career Highlights

Shu-Wei Chung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

He has collaborated with notable colleagues such as Kuo-Feng Yu and Yen-Sen Wang, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion

Shu-Wei Chung's work exemplifies the spirit of innovation in the semiconductor field. His patents and contributions continue to shape the future of technology, making him a significant figure in the industry.

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