Tokyo, Japan

Shinichi Okita

This inventor holds 17 USPTO granted patents and 1 published patent application and 3 EPO patents, primarily in Substrate Processing. Top assignees: Nikon Corporation, Nikon Systems Inc.. Active years: 1995-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Okita. Retrieved from https://idiyas.com/inventor/shinichi-okita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 88.2

 

Average Co-Inventor Count = 1.2

ph-index = 7

Forward Citations = 217(Granted Patents)


Location History:

  • Kumagaya, JP (2003 - 2006)
  • Hishi Tokyo, JP (2009)
  • Nishitokyo, JP (2010 - 2013)
  • Tokyo, JP (1995 - 2015)

Company Filing History:


Years Active: 1995-2015

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Areas of Expertise:
Substrate Processing
Exposure Method
Device Manufacturing
Measurement Apparatus
Alignment Method
Inspection System
Control System
Scanning Exposure
Evaluation System
Computer System
Program
Information Recording
17 patents (USPTO):Explore Patents

Title: The Innovations of Shinichi Okita

Introduction

Shinichi Okita is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing systems and alignment information display methods. With a total of 17 patents to his name, Okita's work has had a substantial impact on technology and industry.

Latest Patents

Okita's latest patents include a substrate processing system, a method of confirmation of its state of use, and a method of prevention of illicit use. The problem addressed by this invention is to enable confirmation of whether a substrate processing system is being illicitly used and to prevent that use when illicit activity is detected. The solution involves a license file that encrypts license information for specific users. A match confirmation program verifies the match between the decrypted license file and device information, network information, and current time obtained from the substrate processing system. If illicit use is detected, the control program halts the operation of the substrate processing system until appropriate actions are taken.

Another notable patent is the alignment information display method, which facilitates efficient analysis and evaluation of alignment results. This method allows users to input data from alignment measurements and parameters, enabling them to easily confirm the effects of set conditions. Consequently, users can detect optimal alignment conditions and parameters with ease.

Career Highlights

Throughout his career, Shinichi Okita has worked with renowned companies such as Nikon Corporation and Nikon Systems Inc. His experience in these organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Okita has collaborated with notable coworkers, including Tsuneyuki Hagiwara and Muneki Hamashima. Their combined efforts have led to advancements in the field of substrate processing and alignment technologies.

Conclusion

Shinichi Okita's contributions to innovation and technology are evident through his numerous patents and collaborations. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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