The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Dec. 12, 2008
Shinichi Okita, Tokyo, JP;
Shinichi Okita, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus restricts reduction in throughput. The exposure apparatus controls movement such that, (1) when a substrate is moving in one direction, a first pattern is moved in a specified direction to expose a first shot region using a first exposure light, then movement of the substrate in the one direction continues while moving the second pattern in the specified direction to expose a second shot region, and (2) then the respective movement directions of the substrate and the second pattern are reversed to expose a third shot region using the second exposure light, then movement of the substrate in the reverse direction continues while moving the first pattern in a direction that is the reverse of the specified direction to expose a fourth shot region using the first exposure light.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile