The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2009

Filed:

Jan. 23, 2006
Applicant:

Shinichi Okita, Hishi Tokyo, JP;

Inventor:

Shinichi Okita, Hishi Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reticle is loaded on a reticle measuring instrument (step S), and the surface shape of the reticle in a state held by a reticle holder of the reticle measuring instrument is measured in advance (step S). Because the surface shape difference between the reticle holder of the reticle measuring instrument and a reticle holder of an exposure apparatus is known, the surface shape of the reticle in a state equivalent to the state held by the reticle holder of the exposure apparatus can be calculated (step S) by adding to the measurement results such surface shape difference.


Find Patent Forward Citations

Okita, Shinichi. (2009). Measuring method, measuring system, inspecting method, inspecting system, exposure method and exposure system, in which information as to the degree of the flatness of an object is pre-obtained (U.S. Patent No. 7593100). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7593100

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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