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For the Inventor, By the Inventor

Koshi, Japan

Shinichi Hatakeyama

This inventor holds 12 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2015-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Hatakeyama. Retrieved from https://idiyas.com/inventor/shinichi-hatakeyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Kumamoto, JP (2019)
  • Koshi, JP (2015 - 2023)

Company Filing History:

goldMedal12 out of 10,883 
 
Tokyo Electron Limited
 patents

Years Active: 2015-2024

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12 patents (USPTO):Explore Patents
1. 12174549 - Liquid amount measuring method and computer-readable recording medium (2024-12-24),
2. 11726409 - Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig (2023-08-15),
3. 11065639 - Coating treatment method, computer storage medium and coating treatment apparatus (2021-07-20),
4. 10295903 - Substrate processing method, substrate processing apparatus and storage medium (2019-05-21),
5. 10139732 - Substrate processing apparatus, substrate processing method and recording medium (2018-11-27),
6. 10048664 - Coating method, computer storage medium and coating apparatus (2018-08-14),
7. 9947534 - Coating treatment method with airflow control, and non-transitory recording medium having program recorded thereon for executing coating treatment with airflow control (2018-04-17),
8. 9791778 - Liquid processing method, liquid processing apparatus and recording medium (2017-10-17),
9. 9162247 - Coating and development treatment system with airflow control including control unit and movable airflow control plate (2015-10-20),
10. 9082614 - Periphery coating apparatus, periphery coating method and storage medium therefor (2015-07-14),
11. 9027508 - Periphery coating apparatus, periphery coating method and storage medium therefor (2015-05-12),
12. 8940649 - Coating treatment method, non-transitory computer storage medium and coating treatment apparatus (2015-01-27),

Title: The Innovative Contributions of Shinichi Hatakeyama

Introduction

Shinichi Hatakeyama is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing systems, holding a total of 12 patents. His work focuses on improving the efficiency and accuracy of liquid measurement methods in various applications.

Latest Patents

Among his latest patents is a liquid amount measuring method and a computer-readable recording medium. This innovative substrate processing system includes a measuring unit that is detachably provided with respect to a placement portion of a placement stage. The system features a measuring jig for measuring processing liquid, a liquid processing unit that supplies the processing liquid to the measuring jig, and a transfer mechanism for moving the measuring jig between the measuring unit and the liquid processing unit. The controller within the system executes several processes, including transferring the measuring jig, ejecting the processing liquid, and calculating the ejection amount based on measurement values.

Career Highlights

Shinichi Hatakeyama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work has been instrumental in advancing technologies that enhance substrate processing capabilities. His innovative approaches have garnered recognition within the industry.

Collaborations

Shinichi has collaborated with notable coworkers, including Kousuke Yoshihara and Koji Takayanagi. Their combined expertise has contributed to the development of cutting-edge technologies in substrate processing.

Conclusion

Shinichi Hatakeyama's contributions to the field of substrate processing systems exemplify his innovative spirit and dedication to advancing technology. His patents and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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