The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Mar. 30, 2018
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A coating and developing apparatusincludes a first protection processing unit U, a film forming unit U, a first cleaning processing unit Uand a control unit U. The control unit Uis configured to control the first protection processing unit Uto form a first protective film on a peripheral portion Wc of a wafer W, control the film forming unit Uto form a resist film on a front surface Wa of the wafer W, control the first cleaning processing unit Uto supply a first cleaning liquid for removing the resist film to the peripheral portion Wc, control the first cleaning processing unit Uto supply a second cleaning liquid for removing a metal component to the peripheral portion Wc, and control the first cleaning processing unit Uto supply a third cleaning liquid for removing the first protective film PFto the peripheral portion Wc.