The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Nov. 24, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Shogo Inaba, Koshi, JP;

Kosuke Yoshihara, Koshi, JP;

Shinichi Hatakeyama, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/08 (2006.01); B05C 5/02 (2006.01); B05D 1/36 (2006.01); B05D 3/12 (2006.01); B05D 1/00 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
B05C 11/08 (2013.01); B05C 5/02 (2013.01); B05D 1/005 (2013.01); B05D 1/36 (2013.01); B05D 3/12 (2013.01); H01L 21/027 (2013.01);
Abstract

A method for coating a top of a substrate with a coating solution includes supplying, before a solution film of the coating solution formed on the substrate dries, a solvent for the coating solution to a peripheral portion on the solution film of the coating solution on the substrate while rotating the substrate at a predetermined rotation speed to form a mixed layer of the coating solution and the solvent at the peripheral portion. The method includes, then, controlling a film thickness of the coating solution after drying by rotating the substrate at a rotation speed higher than the predetermined rotation speed to push the mixed layer to an outer peripheral side.


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