The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Dec. 03, 2013
Tokyo Electron Limited, Tokyo, JP;
Shinichi Hatakeyama, Koshi, JP;
Yoshitomo Sato, Koshi, JP;
Kazuyuki Tashiro, Koshi, JP;
Naofumi Kishita, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A periphery coating unit performs a scan-in process of moving a resist liquid nozzlefrom an outside of an edge Wb of a wafer W to a position above a periphery region Wc of the wafer W while rotating the wafer W and discharging a resist liquid from the resist liquid nozzleand a scan-out process of moving the resist liquid nozzlefrom the position above the periphery region Wc of the wafer W to the outside of the edge Wb of the wafer W while rotating the wafer W and discharging the resist liquid from the resist liquid nozzleFurther, in the scan-out process, the resist liquid nozzleis moved at a speed vlower than a speed vat which the resist liquid is moved to a side of the edge Wb of the wafer W.