Nirasaki, Japan

Shigeru Ishizawa

This inventor holds 21 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignee: Tokyo Electron Limited. Active years: 1998-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Ishizawa. Retrieved from https://idiyas.com/inventor/shigeru-ishizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 76.2


Average Co-Inventor Count = 1.9

ph-index = 8

Forward Citations = 1,463(Granted Patents)


Location History:

  • Ryuo-cho, JP (2000)
  • Yamanshi-ken, JP (2001)
  • Yamanashi-ken, JP (1998 - 2003)
  • Yamanashi, JP (2009 - 2010)
  • Nirasaki, JP (2006 - 2014)
  • Miyagi, JP (2019 - 2024)

Company Filing History:


Years Active: 1998-2026

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21 patents (USPTO):Explore Patents

Title: Shigeru Ishizawa: Innovator in Plasma Processing Technology

Introduction: Shigeru Ishizawa, an accomplished inventor based in Nirasaki, Japan, has made significant contributions to the field of plasma processing technology. With a remarkable portfolio of 20 patents, his innovations have advanced the capabilities of processing systems in various industrial applications.

Latest Patents: Among his recent inventions, the "Focus Ring Replacement Method and Plasma Processing System" stands out. This method is executed by a processor within a plasma processing system that consists of a transfer device and a processing apparatus featuring a process chamber. The innovative approach involves a sequence of steps: first, the transfer device moves the existing focus ring out of the chamber without exposing it to the external atmosphere. Subsequently, the plasma processing apparatus cleans the surface of the mount table. Finally, a second focus ring is introduced into the process chamber and securely placed on the mount table, again without atmospheric exposure. This method enhances the efficiency and cleanliness of the plasma processing environment.

Career Highlights: Shigeru Ishizawa is currently affiliated with Tokyo Electron Limited, a prominent company in the semiconductor manufacturing equipment industry. His expertise is instrumental in the development of cutting-edge technologies that support the evolving landscape of microfabrication and plasma processing.

Collaborations: Throughout his career, Ishizawa has collaborated with talented professionals in the field, including esteemed coworkers Hiroaki Saeki and Tsutomu Hiroki. These partnerships have facilitated the exchange of ideas and fostered a culture of innovation within their work environment.

Conclusion: Shigeru Ishizawa is a notable inventor whose work in plasma processing technology continues to impact various sectors. His latest inventions, particularly the focus ring replacement method, showcase his commitment to advancing industry standards. As he continues to innovate, Ishizawa remains a key figure in the realm of semiconductor technology, leaving a lasting legacy in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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