The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
May. 09, 2003
Takaaki Matsuoka, Tokyo, JP;
Katsuhiko Iwabuchi, Kanagawa, JP;
Shigeru Ishizawa, Yamanashi, JP;
Tsutomu Hiroki, Yamanashi, JP;
Takaaki Matsuoka, Tokyo, JP;
Katsuhiko Iwabuchi, Kanagawa, JP;
Shigeru Ishizawa, Yamanashi, JP;
Tsutomu Hiroki, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Processing chambers (A-F) for applying a process to a substrate W housed therein are provided at a periphery of a conveying chamber. A conveying case () houses the substrate (W) in a state isolated from an outside atmosphere. The conveyance case () has a gate valve () and a transfer mechanism (). A conveying mechanism () supports the conveyance case, and carries the conveyance case () to a position for conveying in/conveying out a substrate. The number of processing chambers connectable to a conveying chamber is not limited, and conveyance to the processing chamber can be executed while maintaining a predetermined ambience for an atmosphere of a substrate that is to be processed.