Kanagawa, Japan

Katsuhiko Iwabuchi

USPTO Granted Patents = 7 

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 46(Granted Patents)


Location History:

  • Tokyo, JP (1995)
  • Tsukui-gun, JP (2009 - 2012)
  • Kanagawa, JP (2010 - 2013)
  • Nirasaki, JP (2020)

Company Filing History:


Years Active: 1995-2020

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7 patents (USPTO):Explore Patents

Title: Inventor Katsuhiko Iwabuchi: Pioneering Advances in Plasma Technology

Introduction

Katsuhiko Iwabuchi, a prominent inventor based in Kanagawa, Japan, has made significant contributions to the field of plasma technology. With a total of seven patents to his name, Iwabuchi has demonstrated his innovative capabilities through his latest inventions that address complex challenges in substrate processing and plasma applications.

Latest Patents

Iwabuchi's recent patents reflect his expertise in plasma technology. One of his notable inventions is the "Plasma Electrode and Plasma Processing Device." This invention features an electrode plate, a ground plate, and an insulating plate, strategically arranged to enhance the discharge of processing gases. The design includes through holes that allow for the introduction and exhaust of gases, ultimately converting the second processing gas into plasma through the application of high-frequency power to the electrode plate.

Additionally, Iwabuchi developed a "Substrate Processing Method," which involves a sequence of steps for efficiently processing a substrate within a chamber. This method utilizes a controlled introduction of hydrogen and oxygen gases, reacting in the presence of a catalyst to produce and eject HO gas toward the substrate. The systematic manipulation of gas flow rates in this method allows for effective substrate treatment.

Career Highlights

Katsuhiko Iwabuchi has been associated with esteemed companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Electron Sagami Limited. His work at these organizations has positioned him at the forefront of innovations in plasma processing technologies.

Collaborations

Throughout his career, Iwabuchi has collaborated with other notable professionals, including Takeo Suzuki and Takashi Tozawa. These collaborations have likely facilitated exchanges of ideas and led to further advancements in their respective fields.

Conclusion

Katsuhiko Iwabuchi's contributions to plasma technology through his innovative patents and collaborative efforts with leading companies underscore his status as a distinguished inventor. His continued work has the potential to influence the future of substrate processing and plasma applications significantly.

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