Sharon Shi

Title: Innovations of Inventor Sharon Shi

Introduction

Sharon Shi is a prominent inventor based in San Jose, California, known for her significant contributions to the field of semiconductor technology. With a total of 16 patents to her name, she has made remarkable advancements in the design and fabrication of silicon wafers and MOSFETs. Her innovative work has had a substantial impact on the industry.

Latest Patents

Sharon Shi's latest patents include a system and method for substrate wafer back side and edge cross section seals. This invention involves accessing a silicon wafer of a first conductivity type and growing an epitaxial layer on its front surface. The process includes implanting the epitaxial layer to form a region of an opposite conductivity type, which is repeated to create a vertical column of the opposite conductivity type. Additionally, her patent on MOSFET active area and edge termination area charge balance describes a method for fabricating a MOSFET that optimizes the breakdown voltage of both the active and edge termination areas while maintaining advantageous RDson.

Career Highlights

Throughout her career, Sharon has worked with notable companies such as Vishay Siliconix and Siliconix Incorporated. Her experience in these organizations has allowed her to develop her expertise in semiconductor technologies and contribute to various innovative projects.

Collaborations

Sharon has collaborated with talented individuals in her field, including Kyle Terrill and Kuo-In Chen. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Sharon Shi's contributions to the semiconductor industry through her patents and collaborations highlight her role as a leading inventor. Her innovative work continues to influence advancements in technology and showcases the importance of creativity in engineering.