Seiji Inaoka

Title: The Innovative Contributions of Seiji Inaoka

Introduction

Seiji Inaoka is a notable inventor based in Macungie, Pennsylvania, known for his significant contributions to the field of microelectronics. With a total of nine patents to his name, he has focused his research on developing formulations and processes that enhance the efficiency and effectiveness of microelectronic device fabrication.

Latest Patents

Among his latest patented innovations, Inaoka has developed a unique cleaning formulation aimed at removing copper-containing post-etch and post-ash residues from patterned microelectronic devices. This composition combines water, a fluoride ion source, an alkanolamine, sulfuric acid, and an organic acid, ensuring the effective removal of copper and cobalt residues while preserving the integrity of exposed low-k dielectric and metal interconnect materials.

Additionally, Inaoka has patented formulations for stripping titanium nitride hard masks and eliminating titanium nitride etch residues. These formulations include an amine salt buffer and a non-ambient oxidizer, in conjunction with liquid carriers such as water and various polar aprotic solvents. With a pH level of less than 4 (preferably under 3 and more ideally under 2.5), these aqueous and semi-aqueous solutions promote high etch rates for titanium nitride while maintaining excellent compatibility with tungsten, aluminum nitride, aluminum oxide, and low-k dielectric materials. The formulations may also incorporate weakly coordinating anions, corrosion inhibitors, and surfactants to enhance performance.

Career Highlights

Seiji Inaoka has held prominent positions at respected companies in the materials science sector, including Versum Materials US, LLC, and Air Products and Chemicals, Inc. Throughout his career, he has made a lasting impact on the development of innovative solutions for the complexities of microelectronic device manufacturing.

Collaborations

Inaoka has collaborated with esteemed professionals in his field, including Wen Dar Liu and William Jack Casteel, Jr. Their collective expertise has contributed to the advancement of innovative cleaning formulations that facilitate more efficient production processes in the microelectronics industry.

Conclusion

Seiji Inaoka's dedication to innovation and his considerable experience in the field of microelectronics underscores the importance of ongoing research and development in this rapidly evolving industry. His patents reflect a commitment to enhancing manufacturing processes, ultimately leading to improved performance and reliability of microelectronic devices. As technology continues to progress, inventors like Seiji Inaoka play a crucial role in shaping the future of microelectronics.