The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Jul. 02, 2015
Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Wen Dar Liu, Chupei, TW;

Seiji Inaoka, Macungie, PA (US);

Yi-Chia Lee, Chupei, TW;

Agnes Derecskei-Kovacs, Macungie, PA (US);

Assignee:

VERSUM MATERIALS US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 3/30 (2006.01); C11D 3/04 (2006.01); C11D 3/20 (2006.01); C11D 3/00 (2006.01); C11D 3/37 (2006.01); C23F 11/14 (2006.01); C23F 11/12 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C11D 3/33 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
C11D 3/30 (2013.01); C11D 3/0073 (2013.01); C11D 3/042 (2013.01); C11D 3/2082 (2013.01); C11D 3/2086 (2013.01); C11D 3/33 (2013.01); C11D 3/3723 (2013.01); C11D 3/3757 (2013.01); C11D 3/3765 (2013.01); C11D 7/265 (2013.01); C11D 7/3209 (2013.01); C11D 7/3245 (2013.01); C11D 11/0047 (2013.01); C23F 11/124 (2013.01); C23F 11/141 (2013.01); H01L 21/02068 (2013.01); H01L 21/6704 (2013.01);
Abstract

There are provided metal corrosion inhibition cleaning compositions, methods and system for copper (Cu), tungsten (W), titanium (Ti), tantalum (Ta), cobalt (Co), and aluminum (Al). The metal corrosion inhibition cleaning compositions provide corrosion inhibition effects by use a combination of two chemicals—at least one multi-functional amine that has more than one amino groups; and at least one multi-functional acid that has more than one carboxylate groups. The metal corrosion inhibition cleaning compositions are effective for cleaning the residues deriving from high density plasma etching followed by ashing with oxygen containing plasmas; and slurry particles and residues remaining after chemical mechanical polishing (CMP).


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