Ryuji Ohtani

Title: Ryuji Ohtani: Innovator in Plasma Processing Technology

Introduction

Ryuji Ohtani, an accomplished inventor from Nirasaki, Japan, has made significant contributions to the field of plasma processing technology. With a remarkable portfolio of 13 patents, Ohtani's innovations focus primarily on advancements in semiconductor fabrication processes, improving efficiency and effectiveness in various applications.

Latest Patents

Among Ohtani’s recent inventions is the plasma processing apparatus and method, which encapsulates a novel etching process. This method involves supplying an etching gas into a process container where a target substrate is supported on a second electrode. By applying RF power for plasma generation along with an RF power for ion attraction, the etching gas is transformed into plasma, allowing the target substrate to undergo precise etching. Furthermore, during this process, Ohtani has ingeniously implemented a negative DC voltage on the upper electrode to optimize the self-bias dynamics, enhancing etching efficiency. Another of his latest patents describes a plasma etching apparatus characterized by an upper and lower electrode, where plasma is generated to etch a wafer. A cooling ring and a correction ring are key features, with a variable DC power supply providing bias to attract ions in the plasma and control the temperature around the target substrate.

Career Highlights

Ryuji Ohtani has worked with notable companies in the industry, including Tokyo Electron Limited and Daihen Corporation, where he honed his expertise and contributed to key developments in plasma technology. His work has significantly influenced the manufacturing processes in semiconductor technology, making strides in etching methods that enhance production quality.

Collaborations

Throughout his career, Ohtani has collaborated with esteemed colleagues including Akira Koshiishi and Masaru Sugimoto. These partnerships have played a crucial role in driving innovative solutions and breakthroughs in the field, further underscoring the importance of teamwork in technological advancement.

Conclusion

Ryuji Ohtani stands out as a pivotal figure in the realm of plasma processing innovations. His extensive portfolio and collaborative efforts demonstrate a dedicated commitment to enhancing semiconductor manufacturing techniques. As the industry continues to evolve, Ohtani's contributions will undoubtedly leave a lasting impact.