The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2010
Filed:
Feb. 18, 2005
Naoto Sagae, Miyagi-gun, JP;
Hiroshi Tsuchiya, Nirasaki, JP;
Tsutomu Higashiura, Nirasaki, JP;
Hideo Kato, Nirasaki, JP;
Ryuji Ohtani, Nirasaki, JP;
Naoto Sagae, Miyagi-gun, JP;
Hiroshi Tsuchiya, Nirasaki, JP;
Tsutomu Higashiura, Nirasaki, JP;
Hideo Kato, Nirasaki, JP;
Ryuji Ohtani, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus includes a lower electrode in a processing chamber on which a object to be processed is mounted; an upper electrode confronting the lower electrode; a first and a second high-frequency power supply for applying high-frequency powers respectively to the upper and the lower electrode; and an output controller for raising each of outputs from the high-frequency power supplies at least three times in a stepwise manner up to each of set levels for processing the object to be processed. The output controller adjusts each of rising times of the outputs from the high-frequency power supplies so that an output of the second high-frequency power supply is raised earlier than an output of the first high-frequency power supply while the outputs from the high-frequency power supplies are raised up to the set levels in a stepwise manner.