Tsutomu Higashiura

Title: Tsutomu Higashiura: Innovator in Plasma Processing Technology

Introduction

Tsutomu Higashiura is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work focuses on developing advanced apparatuses that enhance the efficiency and effectiveness of plasma processing.

Latest Patents

Higashiura's latest patents include a plasma processing apparatus designed to perform plasma processes on target substrates. This apparatus features first and second electrodes positioned to oppose each other within a process chamber. An RF field is generated between these electrodes to convert a process gas into plasma through excitation. The apparatus is equipped with an RF power supply that connects to one of the electrodes via a matching circuit, which automatically adjusts input impedance for optimal RF power delivery. Additionally, he has developed a control method for a plasma processing apparatus that includes a lower electrode and an upper electrode, both of which are essential for processing objects. This method involves a first and second high-frequency power supply that applies power to the electrodes, with an output controller that manages the power levels in a stepwise manner.

Career Highlights

Tsutomu Higashiura is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His innovative work has positioned him as a key figure in the development of plasma processing technologies.

Collaborations

Higashiura has collaborated with notable coworkers, including Yohei Yamazawa and Manabu Iwata. Their combined expertise has contributed to the advancement of plasma processing technologies.

Conclusion

Tsutomu Higashiura's contributions to plasma processing technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively.