The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Dec. 13, 2012
Tokyo Electron Limited, Tokyo, JP;
Daihen Corporation, Osaka-shi, Osaka, JP;
Naoyuki Umehara, Miyagi, JP;
Ryuji Ohtani, Miyagi, JP;
Shunichi Ito, Miyagi, JP;
Kazutaka Sei, Osaka, JP;
Tomomasa Nishida, Osaka, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
DAIHEN CORPORATION, Osaka-Shi, Osaka, JP;
Abstract
In a plasma processing apparatus, first to third RF power monitorsandare configured to monitor high frequency powers (progressive wave powers), which propagate on first to third high frequency power supply linesandfrom first to third high frequency power suppliesandtoward a load side, respectively, and high frequency powers (reflection wave powers), which propagate on the first high frequency power supply linesandfrom the load side toward the first to third high frequency power suppliesand, respectively, at the same time. A main controlleris configured to control the high frequency power suppliesandand matching devicesandbased on monitoring information sent from RF power monitorsand