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For the Inventor, By the Inventor

Kawasaki, Japan

Ryoji Watanabe

This inventor holds 13 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2010-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoji Watanabe. Retrieved from https://idiyas.com/inventor/ryoji-watanabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 92.3

Average Co-Inventor Count = 2.2

ph-index = 3

Forward Citations = 13(Granted Patents)


Company Filing History:

goldMedal13 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 2010-2022

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13 patents (USPTO):Explore Patents
1. 11248086 - Hard-mask forming composition and method for manufacturing electronic component (2022-02-15),
2. 10503068 - Method for forming resist pattern (2019-12-10),
3. 10429735 - Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced (2019-10-01),
4. 10254651 - Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced (2019-04-09),
5. 9964851 - Resist pattern forming method and developer for lithography (2018-05-08),
6. 9618845 - Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern (2017-04-11),
7. 9581909 - Method of trimming resist pattern (2017-02-28),
8. 8349543 - Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material (2013-01-08),
9. 8247159 - Positive resist composition and method of forming resist pattern (2012-08-21),
10. 8236483 - Method of forming resist pattern (2012-08-07),
11. 8007981 - Resist composition and method of forming resist pattern (2011-08-30),
12. 7776511 - Positive resist composition and method of forming resist pattern (2010-08-17),
13. 7645559 - Positive resist composition and method of forming resist pattern (2010-01-12),

Title: Ryoji Watanabe: Innovator in Electronic Component Manufacturing

Introduction

Ryoji Watanabe is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of electronic component manufacturing, holding a total of 13 patents. His work focuses on developing advanced materials and methods that enhance the efficiency and effectiveness of electronic components.

Latest Patents

Watanabe's latest patents include a hard-mask forming composition and a method for manufacturing electronic components. The hard-mask forming composition is designed for use in lithography and consists of a first resin and a second resin. The first resin contains 85% by mass or more of carbon, while the second resin contains 70% by mass or more of carbon, but less than the amount found in the first resin. Additionally, he has developed a method for forming a resist pattern, which involves creating a first contact hole pattern and preparing a structure that includes this pattern. This method utilizes alkali development of a positive-type resist film and involves heating the structure to form organic solvent-soluble and organic solvent-insoluble regions.

Career Highlights

Watanabe is currently employed at Tokyo Ohka Kogyo Co., Ltd., where he continues to innovate in the field of electronic components. His expertise in materials science and engineering has positioned him as a key figure in the development of new technologies.

Collaborations

Throughout his career, Watanabe has collaborated with notable colleagues, including Masaru Takeshita and Takayoshi Mori. These collaborations have furthered advancements in their respective fields and contributed to the success of their projects.

Conclusion

Ryoji Watanabe's contributions to electronic component manufacturing through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of advanced technologies in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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