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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10429735 B1

PDFFull Text
Date of Patent:
Oct. 01, 2019

Filed:

Oct. 04, 2017

Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventor:

Ryoji Watanabe, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08L 71/02 (2006.01); C08F 8/14 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/302 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 8/14 (2013.01); C08L 71/02 (2013.01); G03F 7/0035 (2013.01); G03F 7/40 (2013.01); G03F 7/405 (2013.01); H01L 21/0212 (2013.01); H01L 21/0273 (2013.01); H01L 21/0275 (2013.01); H01L 21/302 (2013.01); H01L 21/31127 (2013.01);
Abstract

A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.

Find Patent Forward Citations

Watanabe, Ryoji. (2019). Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced (U.S. Patent No. 10429735). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10429735

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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