The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Aug. 19, 2016
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Kazufumi Sato, Kawasaki, JP;
Mitsuo Hagihara, Kawasaki, JP;
Tomoya Kumagai, Kawasaki, JP;
Masahito Yahagi, Kawasaki, JP;
Kenta Suzuki, Kawasaki, JP;
Takayoshi Mori, Kawasaki, JP;
Ryoji Watanabe, Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Abstract
A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass: