This inventor holds 39 USPTO granted patents, primarily in Photoresist Technology. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation. Active years: 1998-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sagamihara, JP (1998 - 2005)
- Kanagawa, JP (2003 - 2014)
- Kawasaki, JP (2010 - 2018)
Company Filing History:
39 out of 1,236 
1 out of 7 Years Active: 1998-2024
Areas of Expertise:
Title: Kazufumi Sato: Innovator in Resist Technology
Introduction
Kazufumi Sato, based in Sagamihara, Japan, is a distinguished inventor with an impressive portfolio of 39 patents focused on advancements in resist technology. His work significantly impacts the fields of semiconductor manufacturing and photolithography.
Latest Patents
Among his most recent innovations are two noteworthy patents. The first, titled "Resist composition and method of forming resist pattern," describes a specialized resist composition that includes a silicon-containing resin combined with an acid generator component. This combination generates an acid upon exposure and integrates a photodecomposable base to regulate the acid diffusion efficiently. Notably, the silicon content in the resin ranges from 20% to 25%, optimizing performance.
The second patent, "Resist pattern forming method and developer for lithography," outlines a method for creating resist patterns. This process includes forming a resist film on a support with a resist composition, exposing the resist film, and then developing it using a specific developer. This developer contains a basic compound and tetrabutylammonium hydroxide, with a precise concentration between 2.5% and 2.8% by mass.
Career Highlights
Kazufumi Sato has contributed his expertise to notable companies in the field. He has worked at Tokyo Ohka Kogyo Co., Ltd. and Daito Chemix Corporation, where he was instrumental in developing cutting-edge resist technologies that enhance lithographic processes.
Collaborations
Throughout his career, Sato has collaborated with prominent colleagues, including Kazuyuki Nitta and Toshimasa Nakayama. These partnerships have been pivotal in driving innovative approaches to resist compositions and pattern development.
Conclusion
Kazufumi Sato stands out as a key figure in the innovation of resist technology, with a strong portfolio of patents that showcase his expertise and ingenuity. His contributions to the industry not only enhance semiconductor manufacturing processes but also pave the way for future advancements in lithography.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile