The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Oct. 10, 2006
Kazufumi Sato, Kanagawa, JP;
Yasushi Fujii, Kanagawa, JP;
Hisanobu Harada, Kanagawa, JP;
Koji Yonemura, Kanagawa, JP;
Isamu Takagi, Kanagawa, JP;
Daisuke Kawana, Kanagawa, JP;
Tomotaka Yamada, Kanagawa, JP;
Toshikazu Takayama, Kanagawa, JP;
Kazufumi Sato, Kanagawa, JP;
Yasushi Fujii, Kanagawa, JP;
Hisanobu Harada, Kanagawa, JP;
Koji Yonemura, Kanagawa, JP;
Isamu Takagi, Kanagawa, JP;
Daisuke Kawana, Kanagawa, JP;
Tomotaka Yamada, Kanagawa, JP;
Toshikazu Takayama, Kanagawa, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.