Location History:
- Kanagawa, JP (1997 - 2012)
- Kawasaki, JP (2010 - 2012)
Company Filing History:
Years Active: 1997-2012
Title: Hisanobu Harada: Innovator in Photosensitive Resin Technology
Introduction
Hisanobu Harada is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of photosensitive resin compositions, with a total of 4 patents to his name. His work focuses on developing materials that enhance the stability and performance of photolithography processes.
Latest Patents
One of Hisanobu Harada's latest patents is a photosensitive resin composition and method of forming a pattern. This innovative composition features a quenching function and long-term stability, addressing sensitivity abnormalities that can occur during storage. The resist composition includes a base resin primarily made of a silicon-containing polymer, such as siloxane or silsesquioxane, and utilizes a specific sulfonium compound as a quencher instead of a nitrogenous compound. Additionally, he has developed a comprehensive method for forming patterns that involves multiple steps, including the application of resist films, selective exposure, and etching processes.
Career Highlights
Hisanobu Harada is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work has been instrumental in improving the efficiency and effectiveness of photolithography techniques, which are crucial for the manufacturing of electronic components.
Collaborations
Hisanobu collaborates with talented coworkers, including Yasushi Fujii and Daisuke Kawana. Their combined expertise contributes to the innovative projects at Tokyo Ohka Kogyo Co., Ltd.
Conclusion
Hisanobu Harada's contributions to the field of photosensitive resin technology highlight his role as a key innovator. His patents and ongoing work continue to influence advancements in photolithography, showcasing the importance of innovation in the semiconductor industry.