The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2010

Filed:

May. 24, 2006
Applicants:

Daisuke Kawana, Kawasaki, JP;

Yasushi Fujii, Kawasaki, JP;

Hisanobu Harada, Kawasaki, JP;

Naoki Yamashita, Kawasaki, JP;

Inventors:

Daisuke Kawana, Kawasaki, JP;

Yasushi Fujii, Kawasaki, JP;

Hisanobu Harada, Kawasaki, JP;

Naoki Yamashita, Kawasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thermoacid generator for antireflective film formation, characterized by being represented by the following formula (1): (wherein Rrepresents Calkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen atoms in these groups may have been replaced with fluorine atoms); Rrepresents linear, branched, or cyclic Calkyl, alkenyl, oxoalkyl, or oxoalkenyl, Caryl, or Caralkyl or aryloxoalkyl; Rrepresents hydrogen or alkyl; and Yrepresents a non-nucleophilic counter ion); a composition for forming an antireflective film; and an antireflective film made from the composition. With the thermoacid generator and composition, satisfactory etching resistance and the satisfactory ability to prevent the reflection of short-wavelength light (ability to absorb short-wavelength light) are attained. Furthermore, the antireflective film can inhibit an overlying photoresist film from generating a scum.


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