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Daisuke Kawana

USPTO Granted Patents = 18 (Patent Applications = 3)

Average Co-Inventor Count = 5.4

ph-index = 4

Forward Citations = 37(Granted Patents)

Location History:

Kanagawa-ken, JP (2004)
Kanagawa, JP (2012)
Kawasaki, JP (2007 - 2023)

Company Filing History:

18 out of 1,234

Tokyo Ohka Kogyo Co., Ltd.

patents

4 out of 567

Tokyo Institute of Technology

patents

1 out of 1,714

National Institute of Advanced Industrial Science and Technology

patents

where one patent can have more than one assignee

Years Active: 2004-2023

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18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11780946 - Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern (2023-10-10),

2. 11747724 - Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming method (2023-09-05),

3. 11560444 - Method of producing block copolymer capable of creating specific structure pattern (2023-01-24),

4. 11472956 - Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymer (2022-10-18),

5. 11261299 - Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure (2022-03-01),

6. 10941253 - Block copolymer, and method of producing structure containing phase-separated structure (2021-03-09),

7. 10324377 - Resist composition and method of forming resist pattern (2019-06-18),

8. 10101658 - Resist composition and method of forming resist pattern (2018-10-16),

9. 9766541 - Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound (2017-09-19),

10. 9057948 - Resist composition for EUV or EB, and method of forming resist pattern (2015-06-16),

11. 8227169 - Compound, acid generator, resist composition, and method of forming resist pattern (2012-07-24),

12. 8216763 - Photosensitive resin composition and method of forming pattern (2012-07-10),

13. 7785768 - Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom (2010-08-31),

14. 7666569 - Positive resist composition and method for forming resist pattern (2010-02-23),

15. 7416832 - Positive resist composition (2008-08-26),

Title: Daisuke Kawana: Pioneering Inventor from Kawasaki, JP

Introduction: Daisuke Kawana is a renowned inventor hailing from Kawasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daisuke Kawana holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Daisuke Kawana has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological breakthroughs.

Collaborations: Throughout his career, Daisuke Kawana has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Daisuke Kawana's relentless pursuit of innovation and his passion for creating technology that makes a difference have solidified his position as a trailblazing inventor in the global tech landscape.

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