The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Aug. 14, 2001
Applicant:
Inventors:
Kazuyuki Nitta, Ebina, JP;
Kazufumi Sato, Sagamihara, JP;
Daisuke Kawana, Kanagawa-ken, JP;
Satoshi Shimatani, Yokohama, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/20 ; G03F 7/30 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/20 ; G03F 7/30 ; G03F 7/40 ;
Abstract
The invention discloses a crosslinked chemical-amplification positive-working photoresist composition of good pattern resolution and storage stability, which is suitable for pattern size diminution by the thermal flow process after development. The composition comprises: (A) a polyhydroxystyrene resin substituted for a part of the hydroxyl hydrogen atoms by acid-dissociable solubility-reducing groups; (B) a radiation-sensitive acid-generating compound; (C) a polyvinyl ether compound as a crosslinking agent; (D) a carboxylic acid; and (E) an amine compound.