The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Oct. 04, 2017
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Inventor:
Ryoji Watanabe, Kawasaki, JP;
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01); C08K 5/17 (2006.01); C09D 139/06 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); C08K 5/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08K 5/17 (2013.01); C09D 139/06 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/31138 (2013.01); C08K 5/06 (2013.01);
Abstract
A coating agent capable of favorably reducing the roughness of a resist pattern and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, a quaternary carbon-atom-containing compound, and a solvent, the quaternary carbon-atom-containing compound having an aliphatic hydrocarbon group having 1 to 8 carbon atoms and a group having a specific structure having a specific amount of ethylene oxide and/or propylene oxide added thereto.