Yotsukaido, Japan

Ryoichi Matsuoka

This inventor holds 48 USPTO granted patents and 5 published patent applications, primarily in Image Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd.. Active years: 2008-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoichi Matsuoka. Retrieved from https://idiyas.com/inventor/ryoichi-matsuoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 48 

% Patents Active = 79.2

Average Co-Inventor Count = 3.3

ph-index = 10

Forward Citations = 231(Granted Patents)


Location History:

  • Yotsukaidou, JP (2009)
  • Hitachinaka, JP (2009 - 2013)
  • Yotsukaido, JP (2008 - 2016)
  • Tokyo, JP (2017 - 2020)

Company Filing History:


Years Active: 2008-2020

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Areas of Expertise:
Image Processing
Semiconductor Measurement
Pattern Evaluation
Overlay Error Measurement
Scanning Electron Microscope
Contour Line Extraction
Pattern Inspection
Dimension Measurement
Imaging Recipe Creation
Template Matching
Panorama Image Synthesis
Sample Measurement
48 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ryoichi Matsuoka

Introduction

Ryoichi Matsuoka, a prolific inventor based in Yotsukaido, Japan, holds an impressive record of 48 patents, showcasing his dedication to innovation in the semiconductor industry. His inventions reflect a deep understanding of advanced measurement techniques and image evaluation methodologies that are crucial for the development of semiconductor technologies.

Latest Patents

Among Ryoichi Matsuoka's latest contributions are two noteworthy patents:

1. **Semiconductor Measurement Apparatus and Computer Program**

This invention addresses the challenge of accurately measuring semiconductor patterns despite the presence of multiple deformation causes. The apparatus provides capabilities for measuring dimensions between various points on reference and circuit patterns, as well as defining measurement areas. By selecting a second measured value aggregation based on specific sampling conditions, the apparatus can effectively calculate measurement values that are representative of the actual dimensions.

2. **Image Evaluation Apparatus and Pattern Shape Evaluation Apparatus**

This patent introduces a ground-breaking method and apparatus for evaluating the two-dimensional shapes and changes in shape of semiconductor pattern sidewalls utilizing SEM (Scanning Electron Microscope) images. The device includes a storage unit for model relationships between feature amounts and exposure conditions, an outline creation unit for generating outlines based on SEM images, and an estimation unit to analyze these outlines against the model to derive suitable exposure conditions.

Career Highlights

Ryoichi Matsuoka has had a significant impact in the semiconductor field through his roles at major companies like Hitachi High-Technologies Corporation and Hitachi, Ltd. His career is marked by a commitment to advancing semiconductor measurement and evaluation technologies, making him a respected figure in the industry.

Collaborations

Throughout his career, Matsuoka has collaborated with key individuals such as Yasutaka Toyoda and Takumichi Sutani. These partnerships have enabled the sharing of insights and expertise, further enriching the innovation landscape in which they all work.

Conclusion

Ryoichi Matsuoka's extensive patent portfolio and innovative spirit position him as a leading inventor in the semiconductor sector. His latest inventions illustrate the intersection of technology and practical application, contributing to advancements that enhance measurement precision and image evaluation in semiconductor processes. As technologies continue to evolve, Matsuoka's work remains foundational in pushing the boundaries of what's possible in semiconductor innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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