The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2014

Filed:

Nov. 05, 2009
Applicants:

Atsushi Miyamoto, Yokohama, JP;

Wataru Nagatomo, Yokohama, JP;

Ryoichi Matsuoka, Yotsukaido, JP;

Hidetoshi Morokuma, Hitachinaka, JP;

Takumichi Sutani, Hitachinaka, JP;

Inventors:

Atsushi Miyamoto, Yokohama, JP;

Wataru Nagatomo, Yokohama, JP;

Ryoichi Matsuoka, Yotsukaido, JP;

Hidetoshi Morokuma, Hitachinaka, JP;

Takumichi Sutani, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2005.12);
U.S. Cl.
CPC ...
Abstract

In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.


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