The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Feb. 27, 2012
Applicants:

Ryoichi Matsuoka, Yotsukaido, JP;

Hiroaki Mito, Hitachinaka, JP;

Inventors:

Ryoichi Matsuoka, Yotsukaido, JP;

Hiroaki Mito, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G01B 15/04 (2006.01); H01L 21/66 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G01B 15/04 (2013.01); H01L 22/12 (2013.01); G03F 7/70625 (2013.01);
Abstract

It is an object of the present invention to provide an image processing device for allowing an actual-image-closer pattern to be formed based on the design data, or its simulation image. In order to accomplish the above-described object, the proposal is made concerning an image processing device which includes an image processing unit which sets the operation condition of a charged-particle beam device on the basis of the design data on a semiconductor element. Here, the image processing device accesses a library for storing device-condition information on the charged-particle beam device, pattern types, and a plurality of combinations of pattern information on each pattern-region basis. Moreover, the image processing device forms a composite image of each pattern region, using the pattern information on each pattern-region basis, and based on the device-condition information and the selection of a pattern type from the pattern types.


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