This inventor holds 10 USPTO granted patents. Top assignees: Carl-Zeiss-Stiftung, Carl Zeiss Semiconductor Manufacturing Technologies Ag, Carl-Zeiss-Smt Ag. Active years: 2002-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Essingen, DE (2002 - 2004)
- Esslingen, DE (2003 - 2004)
Company Filing History:
8 out of 702 
1 out of 22 
1 out of 461 Years Active: 2002-2004
Title: Rudolf Von Bünau: Innovator in Projection Exposure Systems
Introduction
Rudolf Von Bünau is a notable inventor based in Essingen, Germany. He holds a total of 10 patents, showcasing his significant contributions to the field of microlithography and optical systems. His work has been instrumental in advancing technologies that enhance image quality in projection systems.
Latest Patents
Among his latest patents is a projection exposure system designed to compensate for image defects occurring in the projection optics. This system is particularly relevant for microlithography applications. It includes a light source that emits a projection light bundle and features a projection optics arranged in the optical path between the object plane and the image plane. The system also incorporates at least one optical correction component, which is coupled to a correction manipulator. This manipulator works in conjunction with a correction sensor device to ensure that image defects are corrected without losing projection light. Another significant patent involves an optical arrangement that utilizes a gas supply apparatus to temper optical elements, thereby avoiding or compensating for light-induced image defects.
Career Highlights
Rudolf has worked with prestigious organizations such as Carl Zeiss Stiftung and Carl Zeiss Semiconductor Manufacturing Technologies AG. His experience in these companies has allowed him to develop and refine his innovative ideas in optical technologies.
Collaborations
Rudolf has collaborated with notable professionals in his field, including Hubert Holderer and Christian Wagner. Their joint efforts have contributed to the advancement of projection exposure systems and optical arrangements.
Conclusion
Rudolf Von Bünau's contributions to the field of microlithography and optical systems are significant. His innovative patents and collaborations have paved the way for advancements in projection technologies. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile