The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2003
Filed:
Aug. 21, 2001
Applicant:
Inventors:
Assignee:
Carl Zeiss SMT AG, , DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G02B 1/700 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G02B 1/700 ;
Abstract
A projection exposure system for microlithography that has a catadioptric projection objective and a light source is claimed. The projection objective has at least one mirror and at least one lens that are composed of specified materials. Also the positions of the mirror and of the lens within the projection objective are also specified. The material and position are specified in such a way that imaging changes in the projection objective that are due to illumination-induced change in the reflecting surface of the mirror counteract illumination-induced imaging changes in the lens. Illumination-induced imaging changes in the entire projection objective are reduced in this way.