The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Dec. 29, 2000
Werner Müller-Rissmann, Oberkochen, DE;
Hubert Holderer, Königsbronn, DE;
Rudolf Von Bünau, Essingen, DE;
Christian Wagner, Aalen, DE;
Jochen Becker, Oberkochen, DE;
Stefan Xalter, Oberkochen, DE;
Wolfgang Hummel, Schwäbach Gmänd, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element ( ) is exposed in a non-rotational-symmetric manner to the radiation of the light source ( ). The optical element ( ) has an absorbing coating ( ). The absorption of the coating ( ) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation ( ) of the light source ( ). As a result of the energy absorbed in the coating ( ), an additional heating of the optical element ( ) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.