The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2003
Filed:
Nov. 22, 2000
Werner Müller-Rissmann, Oberkochen, DE;
Hubert Holderer, Königsbronn, DE;
Rudolf Von Bünau, Essingen, DE;
Christian Wagner, Aalen, DE;
Jochen Becker, Oberkochen, DE;
Stefan Xalter, Oberkochen, DE;
Wolfgang Hummel, Schwabisch Gmund, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source ( ) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation ( ) of the light source ( ) the optical element is substantially symmetrical in relation to an axis of rotational symmetry ( ). The optical element or its housing ( ) is rotatably connected to a frame ( ) by at least one bearing ( ). An actuator ( ) sets the optical element ( ) or its housing ( ) in rotation about the axis of rotational symmetry ( ). The actuation cooperates with a control device ( ). The latter activates the actuator ( ) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.