The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Dec. 29, 2000
Karl-Heinz Schuster, Königsbronn, DE;
Hubert Holderer, Königsbronn, DE;
Rudolf Von Bünau, Esslingen, DE;
Christian Wagner, Aalen, DE;
Jochen Becker, Overkochen, DE;
Stefan Xalter, Oberkochen, DE;
Wolfgang Hummel, Schwabisch Gmund, DE;
Carl-Zeiss-Stiftung, , DE;
Abstract
An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element ( ) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element ( ), a supply apparatus ( to ) for gas is used. The latter having at least one supply line ( ) and at least one gas directing device ( ). The latter is aligned relative to the optical element ( ) and controllable in such a way that the gas is directed by the gas directing device ( ) towards the optical element ( ). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution ( ), which are adapted to the intensity distribution ( ) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element ( ) are avoided or compensated.