Auburndale, MA, United States of America

Ronald Horner


 

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 122(Granted Patents)


Company Filing History:


Years Active: 2005-2014

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9 patents (USPTO):

Title: **The Innovative Journey of Ronald Horner**

Introduction

Ronald Horner, an accomplished inventor based in Auburndale, Massachusetts, has made significant contributions to the field of ion implantation technology. With a total of nine patents to his name, Horner has established himself as a key figure in the advancement of semiconductor processing techniques.

Latest Patents

Among Horner’s most notable inventions is an ion implant apparatus and a method for implanting ions. This innovative device utilizes a drum-type scan wheel that holds wafers with a total cone angle of less than 60°. The apparatus directs a collimated scanned beam of ions, such as hydrogen, along a final beam path that is angled at least 45° to the axis of rotation of the scan wheel. The ion implantation process involves extracting ions from a source and accelerating them along a linear acceleration path to high implant energy, exceeding 500 keV, prior to scanning or mass analysis. Additionally, the mass analyzer is strategically positioned near the axis of rotation, directing unwanted ions to an annular beam dump mounted on the scan wheel, further enhancing efficiency and precision in the implantation process.

Career Highlights

Horner's career includes working with prestigious companies such as GTAT Corporation and Axcelis Technologies, Inc. His expertise in ion implantation and semiconductor technology has been instrumental in the development of cutting-edge solutions that serve the electronics industry.

Collaborations

Throughout his career, Ronald has collaborated with esteemed professionals, including Theodore H. Smick and Geoffrey Ryding. These partnerships have fostered a creative environment conducive to innovative breakthroughs in the field of semiconductor technology.

Conclusion

Ronald Horner's extensive patent portfolio and collaborative work ethic underscore his dedication to pioneering advancements in ion implantation technology. His innovative spirit continues to shape the landscape of semiconductor processing, ensuring his legacy within the industry for years to come.

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