The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Nov. 02, 2010
Geoffrey Ryding, Manchester, MA (US);
Drew Arnold, Salem, MA (US);
William H. Park, Somerville, MA (US);
Ronald Horner, Auburndale, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Drew Arnold, Salem, MA (US);
William H. Park, Somerville, MA (US);
Ronald Horner, Auburndale, MA (US);
Twin Creeks Technologies, Inc., San Jose, CA (US);
Abstract
Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.