The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Sep. 07, 2011
Theodore Smick, Essex, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Takao Sakase, Rowley, MA (US);
William Park, Jr., Somerville, MA (US);
Joseph Gillespie, Boston, MA (US);
Ronald Horner, Auburndale, MA (US);
Paul Eide, Stratham, NH (US);
Theodore Smick, Essex, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Takao Sakase, Rowley, MA (US);
William Park, Jr., Somerville, MA (US);
Joseph Gillespie, Boston, MA (US);
Ronald Horner, Auburndale, MA (US);
Paul Eide, Stratham, NH (US);
GTAT Corporation, Nashua, NH (US);
Abstract
An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.